Abrasive composition
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United States of America Patent
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Apr 20, 1999
Grant Date -
N/A
app pub date -
Dec 1, 1997
filing date -
Dec 6, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An abrasive composition which can realize chemical-mechanical polishing superior in polishing speed and polishing uniformity. The abrasive composition comprises abrasive grains, isopropyl alcohol, and water. Grain sizes of the abrasive grains are preferably 30 to 250 nm, and the abrasive grains are preferably SiO.sub.2. Further, it is preferable that contents of the abrasive grains and isopropyl alcohol are 5 to 30 wt % and 1 to 15 wt %, respectively. The abrasive composition of the present invention is characterized in that it is deaerated.
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