Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus

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United States of America Patent

PATENT NO 5893796
SERIAL NO

08689930

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Abstract

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The polishing pad for a chemical mechanical polishing apparatus and a method of making the same. The polishing pad has a covering lawyer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Birang, Manoocher Los Gatos, CA 192 6027
Gleason, Allan San Jose, CA 20 1014
Guthrie, William L Saratoga, CA 25 2363

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