Vacuum coating apparatus with a crucible in the vacuum chamber to hold material to be evaporated
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United States of America Patent
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Mar 30, 1999
Grant Date -
N/A
app pub date -
Oct 31, 1996
filing date -
Nov 30, 1995
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A vacuum chamber contains a crucible (4) and an electron beam source (5) for evaporating material in the crucible. A substrate holder (6) holds substrates (7) above the crucible (4) with a process space therebetween. A magnetron cathode (11, 12) is located in each of two compartments (9, 10) located on either side of the process space. An aperture (21, 22) connects each compartment to the process space; each cathode (11, 12) carries a target (13, 14) facing away from the respective aperture (21, 22). The cathodes are connected to a medium frequency RF power supply (16), and process gas is supplied to the compartments by lines (17, 18).
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