Apparatus and method for evaluating contamination caused by organic substances deposited on substrate surface
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United States of America Patent
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Mar 16, 1999
Grant Date -
N/A
app pub date -
Jun 4, 1996
filing date -
Jun 13, 1995
priority date (Note) -
Expired
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Abstract
Apparatus and a method for evaluating the contamination over the surface of a substrate for use in manufacturing semiconductor devices, liquid crystal devices and so on, said contamination being caused by contaminants, for instance airborne organic substances or the equivalent in the clean room atmosphere. For evaluation, there is measured with passage of time in the atmosphere having a substantially constant relative humidity the surface resistivity (R) of the substrate 104 by bringing electrodes 106 into close contact with an insulating film as formed on said substrate surface, or a contact angle (.alpha.) of a liquid-drop 207 dropped on the substrate 206. From this measurement, the degree of said contamination is judged by comparing the value of the surface resistivity or contact angle as measured immediately after rinsing the substrate, with the values of the same as measured after exposing the substrate to the objective atmosphere to be evaluated.
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