Polishing machine
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United States of America Patent
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-
Mar 9, 1999
Grant Date -
N/A
app pub date -
Apr 14, 1997
filing date -
Apr 25, 1996
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A polishing machine of the present invention is capable of uniformly polishing a member to be polished with high flatness, and polishing cloth, which is employed in the polishing machine, is uniformly abraded. In the polishing machine, a polishing plate is capable of rotating. A supporting table rotatably supports the polishing plate. A rotary driving mechanism is mounted on the supporting table, and it rotates the polishing plate. A base supports the supporting table. An orbital driving mechanism moves the supporting table along a circular orbit without spinning about its own axis.
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