Photosensitive resin composition

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United States of America Patent

PATENT NO 5866296
SERIAL NO

08845450

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Abstract

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A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive resin composition is high in sensitivity, good in storage stability, and easy to produce, and is suitable for use in a screen printing plate, formation of black matrix or phosphor pattern of a color cathode-ray tube, a CCD or LCD color filter, a printing color proof, and various etching resists.

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Patent Owner(s)

Patent OwnerAddress
TOYO GOSEI CO LTD1603 KAMIMYODEN ICHIKAWA-SHI CHIBA 2720012

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kikuchi, Hideo Funabashi, JP 88 1977
Miyazaki, Mitsuharu Funabashi, JP 4 19
Shibuya, Toru Funabashi, JP 19 142
Tochizawa, Noriaki Funabashi, JP 12 51

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