Rinse water recycling method for semiconductor wafer processing equipment
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United States of America Patent
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Jan 5, 1999
Grant Date -
N/A
app pub date -
May 14, 1997
filing date -
May 14, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Waste water from an apparatus that rinses particles from semiconductor wafers is collected in a tank. A pump sends waste water from the tank through a particle filter and onward to a supply inlet for initial rinse stages of the processing apparatus. Some of the waste water is bleed from the tank and replenished by fresh water introduced into the final rinse stage of the apparatus. If the semiconductor processing so dictates, chemicals may be added to the waste water to alter the pH and/or prevent the precipitation of solids in the tank. The addition of such chemicals can be controlled automatically in response to sensed characteristics of the waste water.
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