Method for processing waste gas exhausted from chemical vapor and deposition equipment
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United States of America Patent
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Jan 5, 1999
Issued Date -
N/A
app pub date -
Nov 7, 1997
filing date -
Nov 29, 1994
priority date (Note) -
Expired
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Abstract
A method of processing waste gas exhausted from chemical vapor deposition equipment, which entails: a) contacting a waste gas containing viscous substances with a filtering aid agent, b) passing the waste gas containing the viscous substances exhausted from the chemical vapor deposition equipment, and which has been contacted with the filtering aid agent, through a filtering and dust collecting unit, whereby the viscous substances are condensed with the filtering aid agent on the filtering and dust collecting unit, and c) removing the condensed matter from the surface of the filter, thereby preventing clogging thereof.
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