Positive-working radiation-sensitive mixture

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United States of America Patent

PATENT NO 5843319
SERIAL NO

08902072

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Abstract

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A process for producing a solution of a basic or non-basic sulfonium compound (A) of formulae II-V: ##STR1## wherein R.sup.5, R.sup.6 and R.sup.7 each independently represent a C.sub.1 -C.sub.18 alkyl, aryl or heteroaryl group or an aryl group mono-, di- or tri-substituted with an alkyl, an alkylaryl, an aryl, a halogen, an alkoxy, a phenoxy, a thiophenol, a phenylsulfonyl or a phenylsulphenyl; Y represents (CH.sub.2).sub.n (wherein n is 0 or 1), O or S; R.sup.8 and R.sup.9 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; R.sup.10 and R.sup.11 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; n is 5 or 6; and X.sub.2.sup.- represents a basic anion having a pK.sub.B value of -3 to +5; comprising the steps of: (a) dissolving a sulfonium salt (B) in a metal-ion free polar or non-polar solvent to form a solution, said sulfonium salt (B) being selected from said formulae II-V, wherein R.sup.5 to R.sup.11, Y and n of said sulfonium salt (B) have the sane meaning as above and X.sub.2.sup.- represents a non-nucleophilic anion; (b) contacting said solution for a sufficient amount of time with a basic ion-exchange resin having a quaternary ammonium group to replace the anion of (B) with a hydroxide ion and to form a sulfonium hydroxide solution; (c) separating said sulfonium hydroxide solution from the resin; and optionally (d) adding an active hydrogen containing compound or its base-labile precursor to said sulfonium hydroxide solution to yield a solution of the sulfonium compound (A) wherein X.sub.2.sup.- represents a basic anion other than a hydroxy ion.

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Patent Owner(s)

Patent OwnerAddress
AZ ELECTRONIC MATERIALS USA CORP70 MEISTER AVENUE SOMERVILLE NJ 08876

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dammel, Ralph Flemington, NJ 33 347
Endo, Hajime Saitama, JP 8 179
Kinoshita, Yoshiaki Saitama, JP 58 722
Kudo, Takanori Saitama, JP 41 577
Masuda, Seiya Saitama, JP 13 184
Okazaki, Hiroshi Saitama, JP 157 2266
Padmanaban, Munirathna Saitama, JP 55 936
Pawlowski, Georg Wiesbaden, DE 73 948
Przybilla, Klaus Juergen Frankfurt, DE 1 8
Suehiro, Natsumi Saitama, JP 6 121

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