In situ method for metalizing a semiconductor catalyst
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 10, 1998
Grant Date -
N/A
app pub date -
Apr 30, 1996
filing date -
Apr 30, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A semiconductor catalyst is metalized in situ on a reaction support surface by illuminating at least a portion of the catalyst in the presence of a suitable source of metal to selectively deposit the metal on the illuminated portions. The source of metal can be applied to the reaction support surface either with the catalyst or separately, but is not attached to the catalyst until the structure is illuminated. This causes the metal to be deposited where the catalyst will be illuminated during use and therefore where photopromoted catalytic degradation can occur.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully