Pattern alignment and cutting system
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United States of America Patent
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-
Nov 3, 1998
Grant Date -
N/A
app pub date -
Sep 8, 1995
filing date -
Sep 8, 1995
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A pattern alignment system for use during the garment development process prior to the cutting operation includes a table with work surface. There is a digitizer located with the surface. The operator establishes a perimeter of a hide or other fabric piece that has been positioned on the surface with a stylus that presents position signals to a controller in real time. The controller has signals corresponding to a marker and further includes algorithms to compose the drawn lines or points into an electronic representation of the piece perimeter. Defects, textures or the like in the piece are identified in a similar manner. The system includes algorithms which enable the operator to reposition one or more garment segment patterns in the marker to avoid defects or otherwise optimize the segment position on the piece.
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