Chemical-mechanical polishing apparatus with in-situ pad conditioner
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United States of America Patent
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Nov 3, 1998
Grant Date -
N/A
app pub date -
Apr 14, 1997
filing date -
Apr 14, 1997
priority date (Note) -
Expired
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Abstract
Chemical-mechanical polishing apparatus includes a pad reconditioning mechanism which comprises nested conical tubes which overly the pad. The outer tube has an array of holes in it much like the head of an electric razor and is rotated about its axis by being in contact with the rotating pad. The inner cone is stationary and has a longitudinal, downward-facing slot. An air stream from the narrow end of the inner cone towards the wide end carries particle-laden slurry to the wide end for removal or recycling. The nested cones are arranged like a detachable bridge with the narrow end secured to a non-rotating center core and the wide end secured to the top of the table in which the (now annular) platen rotates.
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