Non-corrosive cleaning composition for removing plasma etching residues
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United States of America Patent
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Oct 6, 1998
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N/A
app pub date -
Sep 6, 1996
filing date -
Sep 6, 1996
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Abstract
A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containing oligomers having a molecular weight in the range of about 220 to about 5,000.
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