Method for manufacturing monolithic capillary X-ray lens, a monolithic capillary X-ray lens and apparatus using same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 22, 1998
Grant Date -
N/A
app pub date -
Feb 14, 1997
filing date -
Feb 17, 1996
priority date (Note) -
In Force
status (Latency Note)
![]() |
A preliminary load of PAIR data current through [] has been loaded. Any more recent PAIR data will be loaded within twenty-four hours. |
PAIR data current through []
A preliminary load of cached data will be loaded soon.
Any more recent PAIR data will be loaded within twenty-four hours.
![]() |
Next PAIR Update Scheduled on [ ] |

Importance

US Family Size
|
Non-US Coverage
|
Patent Longevity
|
Forward Citations
|
Abstract
A method for manufacturing the monolithic capillary X-ray lens, comprising the steps of Drawing a hollow glass raw-tube into monocapillaries in a heating furnace by a drawing tower; Stacking monocapillaries into a symmetric mould to form a multibundle; Feeding the multibundle into the heating furnace to be heated at uniform speed or variable speed; Drawing the multibundle by a drawing tower at uniform speed and variable speed to form a first integrated lens billet; Cutting the monolithic lens billet into desired shape according to usage to form said first monolithic capillary X-ray lens. A monolithic capillary X-ray lens produced by using said method comprises a plurality of X-ray channels passing from one end through another end, and is a single glass solid formed by melting together the walls themselves of said X-ray channels. An X-ray diffractometer employing said lens comprises an X-ray source, a sample, a detector, a high voltage power supply, an amplifier, a pulse analyzer, a scaler, a ratemeter, a computer, an X-ray source control system and a goniometer, wherein the monolithic capillary X-ray lens are disposed between the X-ray source and the sample and/or between the sample and the detector.
First Claim
all claims..Other Claims data not available
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
BEIJING NORMAL UNIVERSITY | NO 19 XINWAIDAJIE BEIJING 100875 | |
CHINA AEROSPACE CORPORATION | NO 8 FUCHENG ROAD HAIDAIN DISTRICT BEIJING 100830 |
International Classification(s)

- 1997 Application Filing Year
- G21K Class
- 64 Applications Filed
- 26 Patents Issued To-Date
- 40.63 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Chen, Baozhen | Beijing, CN | 11 | 104 |
# of filed Patents : 11 Total Citations : 104 | |||
Ding, Xunliang | Beijing, CN | 1 | 31 |
# of filed Patents : 1 Total Citations : 31 | |||
He, Yejun | Beijing, CN | 1 | 31 |
# of filed Patents : 1 Total Citations : 31 | |||
Liu, Andong | Beijing, CN | 34 | 108 |
# of filed Patents : 34 Total Citations : 108 | |||
Wang, Dachun | Beijing, CN | 3 | 32 |
# of filed Patents : 3 Total Citations : 32 | |||
Wei, Fuzhong | Beijing, CN | 2 | 31 |
# of filed Patents : 2 Total Citations : 31 | |||
Yan, Yiming | Beijing, CN | 2 | 31 |
# of filed Patents : 2 Total Citations : 31 |
Cited Art Landscape
- No Cited Art to Display

Patent Citation Ranking
- 31 Citation Count
- G21K Class
- 90.63 % this patent is cited more than
- 27 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text

Legal Events

Matter Detail

Renewals Detail
