Method for generating a continuously stitched regional carved fill composite embroidery stitch pattern
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United States of America Patent
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Sep 22, 1998
Grant Date -
N/A
app pub date -
Feb 3, 1997
filing date -
Feb 3, 1997
priority date (Note) -
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Abstract
A method for generating a continuously stitched regional carved fill composite embroidery stitch pattern, in which the composite stitch pattern comprises one or more carved fill stitch patterns disposed in a defined fill region in a background region which comprises a background embroidery stitch pattern, includes the steps of detecting regions of overlap in the composite embroidery stitch pattern between the background stitch pattern and the carved fill stitch pattern, and selectively stitching the composite embroidery stitch pattern by filling the areas of overlap solely with the carved fill stitch pattern wherever the overlap is detected and filling the areas of no such overlap in the composite embroidery stitch pattern solely with the background stitch pattern wherever the overlap is not detected during the continuous stitching of the composite embroidery stitch pattern. The carved fill pattern is, thereby, not stitched on top of the background pattern in the resulting composite embroidery stitch pattern even though the visual effect is one of layering. In accordance with the present method, there may be multiple carved filled regions which are layered on top of each other or which are spaced apart in a non-contiguous manner over the background region, and each of these carved filled patterns may be different from each other. Moreover, the carved fill pattern may be complex or simple, such as a tile pattern, or one in which the area of no overlap comprises a hole in the carved fill stitch pattern. Because this method is a continuous stitching operation, the composite pattern or design may be completed in a single stitching operation.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
PULSE MICROSYSTEMS LTD | MISSISSAUGA ONTARIO L5N 6M6 |
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Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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Mok, Man-Kam | Markham, CA | 1 | 3 |
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Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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