Cleanser composition comprising an alkali metal salt of a secondary Amide-type N-Acylamino acid , and alkali metal salt of a higher fatty acid , and an amphoteric surfactant

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United States of America Patent

PATENT NO 5767059
SERIAL NO

08703535

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides a cleanser composition which is free from any thickener, contains surfactant(s) at such a concentration as not to irritate the skin or mucosa, can impart an appropriate consistency to the cleanser, exhibits excellent foaming, can be easily taken out from a container in use and gives a good feel in use. The cleanser composition comprises the following components (A), (B) and (C): (A) an alkali metal salt of a secondary amide-type N-acylamino acid represented by formula (1): R.sup.1 CONH(CH.sub.2).sub.n COOH (1) wherein R.sup.1 CO represents a linear acyl group having 10 to 16 carbon atoms; and n is a number of 1 or 2; (B) an alkali metal salt of a higher fatty acid; and (C) an amphoteric surfactant; and the mixing ratio by weight of (A+B)/C ranges from 2.5/1 to 1/2.

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Patent Owner(s)

Patent OwnerAddress
KAO CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kajihara, Yasushi Tokyo, JP 15 117
Umemoto, Isao Tokyo, JP 3 55

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