Shallow trench isolation with oxide-nitride/oxynitride liner
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United States of America Patent
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Jun 9, 1998
Grant Date -
N/A
app pub date -
Jan 28, 1997
filing date -
Jan 28, 1997
priority date (Note) -
Expired
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Abstract
Disclosed is an improved process and liner for trench isolation which includes either a single oxynitride layer or a dual oxynitride (or oxide)/nitride layer. Such a process and liner has an improved process window as well as being an effective O.sub.2 diffusion barrier and resistant to hot phosphoric and hydrofluoric acids.
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