Photoresist stripping and cleaning compositions
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United States of America Patent
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Jun 2, 1998
Grant Date -
N/A
app pub date -
Sep 6, 1996
filing date -
Sep 6, 1996
priority date (Note) -
Expired
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Abstract
A stripping and cleaning composition comprising water, at least one amine compound, and at least one corrosion inhibitor selected from (a) quaternary ammonium silicate and (b) a catechol nucleus-containing oligomer having a molecular weight of about 220 to about 5,000, and optionally a polar organic solvent.
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