Rinse water recycling in CMP apparatus
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United States of America Patent
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May 26, 1998
Issued Date -
N/A
app pub date -
Mar 17, 1997
filing date -
Jul 29, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Recycled slurry is continuously blended with the slurry in use to provide a consistent polishing rate while consuming or discarding a small fraction of the slurry flowing continuously across the polishing pad. The slurry is recovered in a catch ring and fed to a recycle loop to blend the recovered slurry with fresh slurry, rejuvenating chemicals, or water; test the blend; filter the blend; and return the blend to the polishing pad. The volume returned to the pad slightly exceeds the volume recovered, causing the catch ring to overflow. Rinse water is recycled in the same fashion to keep the polishing pad wet between polishing cycles.
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