Resist processing apparatus for a rectangular substrate
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United States of America Patent
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Feb 17, 1998
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N/A
app pub date -
Apr 4, 1995
filing date -
Apr 4, 1994
priority date (Note) -
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Abstract
A apparatus of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.
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