Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same
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United States of America Patent
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Feb 10, 1998
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N/A
app pub date -
Jul 3, 1996
filing date -
Jul 3, 1995
priority date (Note) -
Expired
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Abstract
A positive-working photosensitive composition comprises: (1) an alkali-soluble resin; (2) a quinonediazide compound; (3) an organic phosphoric compound; and (4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.
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