Independently controllable shutters and variable area apertures for off axis illumination
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United States of America Patent
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Jan 27, 1998
Grant Date -
N/A
app pub date -
Mar 4, 1996
filing date -
Mar 4, 1996
priority date (Note) -
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Abstract
New types of apertures to vary the size and shape of the aperture area without the need to change the whole aperture plate in off axis lithography. The off axis illumination apertures allow the size and shape of apertures to be changed without having to change the aperture plates for each step in the lithographic process. The aperture plate is fitted with simple shutter mechanisms that allow the ready adjustment of the aperture openings.
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