Parylene deposition apparatus including a heated and cooled dimer crucible
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United States of America Patent
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Jan 20, 1998
Grant Date -
N/A
app pub date -
Oct 27, 1995
filing date -
Oct 27, 1995
priority date (Note) -
Expired
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Abstract
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated and cooled dimer receptacle for fast and efficient vaporization of parylene dimer material.
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