Mixtures of mono- and DI- or polyfunctional silanes as silylating agents for top surface imaging
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United States of America Patent
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Jan 13, 1998
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N/A
app pub date -
Dec 4, 1995
filing date -
Dec 4, 1995
priority date (Note) -
Expired
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Abstract
Top surface imaging by silylation of organic photoresists for use in lithographic techniques for the manufacture of microelectronic devices is improved by the use of certain mixtures of organosilane silylating agents. The mixture includes a monofunctional silane in combination with a di- or polyfunctional silane, selected such that the boiling points are the same or very close to each other to facilitate a vapor-phase reaction. Silylation with this mixture provides effective penetration of the silane into the resist without causing so much lowering of the glass transition temperature of the resist that the resist flows under the processing steps and distorts the pattern.
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