Modular sputtering machine having batch processing and serial thin film sputtering
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United States of America Patent
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Jan 6, 1998
Grant Date -
N/A
app pub date -
Aug 7, 1995
filing date -
Aug 7, 1995
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A flexible, modular sputtering machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a sputtering station including a serial sputtering chamber and an interchamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the sputtering chamber. A preferred sputtering source is also provided which allows selective sputtering of multiple materials within a single sputtering chamber. The selection of sputtering materials is controlled by varying the magnetic field within the sputtering chamber. A cassette for transporting and holding batches of disk substrates during batch processing allows individual access to the disks for the interchamber disk transfer mechanism.
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