Polymers and photosensitive mixture prepared therewith

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United States of America Patent

PATENT NO 5700621
SERIAL NO

08607809

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Abstract

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A polymer comprising repeating units of the formula ##STR1## wherein R.sup.1 , R.sup.2 and R.sup.3 are, independently of one another, hydrogen atoms or alkyl groups, X is CO or SO.sub.2, and Y and Z are, independently of one another, alkyl, alkenyl, cycloalkyl, aryl or heterocyclic radicals, or Y and Z are linked to one another and are constituents of a five-membered or six-membered hetero-cyclic ring.

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Patent Owner(s)

Patent OwnerAddress
AGFA-GEVAERT AG51373 LEVERKUSEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Eichhorn, Mathias Niedernhausen, DE 14 78
Elsaesser, Andreas Idstein, DE 33 304

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