Unibody gas plasma source technology
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United States of America Patent
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Dec 16, 1997
Grant Date -
N/A
app pub date -
Nov 1, 1995
filing date -
Nov 1, 1995
priority date (Note) -
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Abstract
A unibody, monolithic, one-piece PBN plasma chamber for an MBE gas plasma source. The chamber has a cylindrical configuration with at least one effusion orifice and a gas inlet opening. The gas inlet opening is preferably communicatively connected to an elongated, tubular inlet member. The inlet member is preferably coupled to a liquid cooled gas source by an intermediary connection member which is preferably constructed of a refxactory metal. The chamber minimizes leakage and maximizes efficiency. A gas plasma source assembly and a method for making the chamber are also disclosed.
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