Wafer processing apparatus
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United States of America Patent
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-
Dec 16, 1997
Grant Date -
N/A
app pub date -
Apr 11, 1995
filing date -
Jul 17, 1992
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention refers to a wafer transfer robot for a wafer boat of a wafer processing apparatus wherein a turntable within a chamber of a turntable apparatus is provided with a prescribed number of stations formed thereon. Each of the stations is provided with protrusions that hold a wafer cassette that is transferred thereto and orientated thereon in such a manner that a base surface thereof is inclined at an angle to the outward direction. Although, while the wafer cassette is being transferred and orientated, it is transferred and orientated reliably with the base surface thereof held horizontal by an elevator apparatus. By providing a loadlock chamber of a rotational configuration, the apparatus of the present invention ensures good sealing, and also ensures that when regions within the apparatus are being evacuated or being filled with an inert gas, they are kept reliably airtight. The generation of particles due to linear frictional movement is thus prevented, and the wafer processing can be performed extremely reliably and efficiently.
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