Pattern forming material including photoacid and photobase generators for large exposure latitude
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 25, 1997
Grant Date -
N/A
app pub date -
Mar 29, 1996
filing date -
Dec 25, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully