Process for reacting dissociated zircon with gaseous hydrogen fluoride
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United States of America Patent
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Nov 18, 1997
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app pub date -
Jan 24, 1995
filing date -
Jan 31, 1994
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Abstract
A process for treating dissociated zircon comprises reacting dissociated zircon with gaseous hydrogen fluoride at an elevated reaction temperature. The reaction temperature is controlled to obtain at least one desired zirconium-based compound and at least one desired silicon-based compound.
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