Apparatus for improving the optical intensity induced damage limit of optical quality crystals
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United States of America Patent
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Oct 21, 1997
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Jul 26, 1995
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Jul 26, 1995
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Abstract
The apparatus of the present invention significantly improves the optical intensity induced damage limit of optical quality crystals, and in particular crystals used in the conversion of laser radiation at a specific wavelength to another wavelength or other wavelengths through non-linear interaction of the input laser radiation with the optical crystal medium. In accordance with the present invention, passive optical elements are positioned at the laser beam exiting and entrance surfaces of the active optical element. The surfaces of the passive optical elements are placed up against respective exiting and entrance surfaces of the active optical element. Since the optically transparent passive optical elements have higher mass than optical coatings, they provide vastly superior cooling, and therefore, considerably higher laser damage threshold for the surfaces. Higher damage thresholds results in a significant increase in the performance, reliability, and failure damage safety margin while reducing size and cost of high intensity laser systems and subsystems that utilize active optical elements.
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