Plasma apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5679204
SERIAL NO

08621527

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Components such as an earth plate, a gas introduction ring, and the like placed in a reaction chamber in a plasma apparatus are made of aluminum containing magnesium in a concentration of 2.2 to 2.8% by weight and are not coated with alumite. In addition, a heater incorporated in a section of the reaction chamber heats the section during a plasma cleaning process. Further, an electrical discharge chamber is also incorporated in the plasma apparatus for providing a plasma to the reaction chamber for efficient plasma cleaning of the apparatus.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI DENKI KABUSHIKI KAISHATOKYO 100-8310
RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORP1 MIZUHARA 4-CHOME ITAMI-SHI HYOGO 664
SHIKOKO INSTRUMENTATION CO LTD12-56 WAKABAMACHI TADOTSUCHO NAKATADOGUN KAGAWA 764

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kobayashi, Masayuki Kochi, JP 205 1617
Komemura, Toshio Tokyo, JP 9 121
Maeda, Kiyoshi Hyogo, JP 27 309
Matsumura, Tamio Tokyo, JP 10 35
Ohnishi, Hiroshi Tokyo, JP 78 1890
Tanaka, Hiroshi Tokyo, JP 1068 12184
Toyota, Masato Tokyo, JP 4 21

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