Silicon membrane and method of making same
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United States of America Patent
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-
Sep 30, 1997
Grant Date -
N/A
app pub date -
Aug 15, 1995
filing date -
Aug 16, 1994
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A silicon membrane for use as a micromechanical sensor or as a mask for projection lithography is fabricated by doping a silicon wafer to different thicknesses at different portions and then electrochemically etching away the undoped portion of the wafer.
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