Photosensitive composition containing photosensitive and heat developable element and polymer element and image-forming method utilizing the same

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United States of America Patent

PATENT NO 5663032
SERIAL NO

08180460

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Abstract

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A photosensitive material comprises a photosensitive composition comprising a photosensitive and heat-developable element and a photopolymerizable element. An imagewise unexposed area on the material is polymerized by imagewise exposure, heating and whole areal exposure. The photosensitive and heat-developable element comprises at least a photosensitive silver halide, an organic silver salt and a reducing agent of the formula ##STR1## The photopolymerizable element comprises at least a polymerizable polymer precursor and a photopolymerization initiator. An image forming method comprises the steps; subjecting a photosensitive material in the same layer to imagewise exposure and heating to form an image; and subjecting the resultant photosensitive material to whole areal exposure to polymerize and imagewise unexposed or exposed area thereof.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHAJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arahara, Kozo Kawasaki, JP 10 110
Fukui, Tetsuro Kawasaki, JP 89 1040
Fukumoto, Hiroshi Kawasaki, JP 133 1875
Isaka, Kazuo Tokyo, JP 46 884
Kagami, Kenji Atsugi, JP 22 171
Katayama, Masato Yokohama, JP 63 805
Miura, Kyo Yokohama, JP 28 540
Mouri, Akihiro Atsugi, JP 87 1564
Takasu, Yoshio Tama, JP 52 686

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