Imaging system for deep ultraviolet lithography
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 22, 1997
Grant Date -
N/A
app pub date -
Aug 14, 1995
filing date -
Aug 14, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A catadioptric reduction system operating in the deep ultraviolet range projects a reduced image of a mask on a substrate. A reducing optic made of a material transmissive to deep ultraviolet light has a concave front face covered by a partially reflective surface and a convex back face covered by a concave reflective surface surrounding a central aperture. The partially reflective surface transmits a portion of the light passing through the mask to the concave reflecting surface, which returns a portion of the transmitted light to the partially reflective surface. A portion of the returned light is reflected by the partially reflective surface on a converging path through said central aperture for producing a reduced image of the mask on the substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully