Apparatus for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process
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United States of America Patent
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Jul 22, 1997
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N/A
app pub date -
Nov 29, 1995
filing date -
Nov 29, 1995
priority date (Note) -
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Abstract
Apparatus for removing harmful substances of an exhaust gas discharged from a semiconductor manufacturing process are provided. The apparatus includes a mechanism for: removing at least one of a water-soluble component, a hydrolyzable component and dust contained in the exhaust gas discharged from semiconductor manufacturing equipment by water scrubbing; heating the water-scrubbed exhaust gas to thermally decompose a thermally-decomposable component contained therein; and removing dust generated by the thermal decomposition from the thermally-decomposed exhaust gas by water scrubbing to render the thermally decomposed exhaust gas into a clean exhaust gas.
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