Electrode designs for high pressure magnetically assisted inductively coupled plasmas
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United States of America Patent
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Jul 15, 1997
Issued Date -
N/A
app pub date -
Jun 28, 1994
filing date -
Sep 1, 1992
priority date (Note) -
Expired
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Abstract
A plasma system is disclosed comprising a vessel suitable for containing a plasma at a pressure of at least about 100 mtorr, a plasma gas in the vessel at a pressure of at least 100 mtorr, an antenna with a substantially planar face positioned adjacent a portion of the vessel for applying an electromagnetic field to the plasma gas to thereby generate and maintain a plasma, and means for applying an external magnetic field to the plasma gas other than the field generated by the antenna, and having a component in a direction substantially perpendicular to the planar face of the antenna.
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