Polishing machine and a method of polishing a work
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United States of America Patent
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Jul 15, 1997
Grant Date -
N/A
app pub date -
Apr 12, 1994
filing date -
Nov 1, 1993
priority date (Note) -
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Abstract
The object of the invention is to provide a polishing machine, which are capable of making the degree of plane higher. The polishing machine comprises: a polishing plate for polishing a work, which is pressed thereon, the polishing plate being capable of rotating; and a driving mechanism for rotating the polishing plate, characterized in that the driving mechanism is capable of rotating the polishing plate in one direction and the other direction. In the polishing machine, since the work is polished by rotating the polishing plate in the one direction, then rotating it in the other direction, slury concentrated at a specific position of the work can be scattered, so that the work can be polished uniformly and the degree of plane can be higher.
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