Novolak resin blends for photoresist applications
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 8, 1997
Issued Date -
N/A
app pub date -
Aug 5, 1996
filing date -
Dec 29, 1992
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention relates to a water insoluble, aqueous alkali soluble novolak resin blend, wherein the resin blend comprises two novolaks having dissimilar relative molecular weights and similar dissolution rates, a process for producing such a resin blend, a photoresist containing such a resin blend and a method for producing a semi-conductor device utilizing such a photoresist.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully