Focused ion beam column with electrically variable blanking aperture
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United States of America Patent
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Jun 10, 1997
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N/A
app pub date -
Mar 20, 1996
filing date -
Mar 20, 1996
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Abstract
A focused ion beam column featuring a combination of blanker electrodes and a chicane system of electrodes which permit selection of a target spot size by selection of appropriate voltages applied to the chicane electrodes. The chicane potentials deflect the beam such as to select the closest distance between the center of the beam and the edge of a blocker plate thus reducing beam blurring when the beam is quickly turned off and on.
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