Electron-beam exposure system for reduced distortion of electron beam spot
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United States of America Patent
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May 20, 1997
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N/A
app pub date -
May 5, 1995
filing date -
Dec 28, 1993
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Expired
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Abstract
An electron-beam exposure system includes an astigmatic compensation circuit that increases a voltage applied across a pair of electrodes forming an electrostatic sub-deflector and simultaneously decreases a voltage applied across another pair of electrodes forming the same electrostatic sub-deflector with a same magnitude as in the case of increasing the voltage, wherein the magnitude of the voltage change is changed in response to the deflection of the electron-beam caused by a main deflector.
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