Process for reducing trace levels of metallic impurities in cyclized polyisoprene resin
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United States of America Patent
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Apr 22, 1997
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N/A
app pub date -
Jul 19, 1995
filing date -
Jul 19, 1995
priority date (Note) -
Expired
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Abstract
A process for reducing trace levels of metallic impurities in cyclized polyisoprene resin is disclosed. The process reduces trace levels of metallic impurities in cyclized polyisoprene resin by washing an impure organic solvent/cyclized polyisoprene resin solution at least once with a heated aqueous acidic solution, and subsequently washing the resin at least once with heated water.
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