Redox reagent-containing post-etch residue cleaning composition
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United States of America Patent
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Mar 18, 1997
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N/A
app pub date -
Jul 7, 1995
filing date -
Jul 7, 1995
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Expired
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Abstract
A noncorrosive post-etch residue cleaning composition containing: (a) 1-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 1-70% by weight of selected amine compounds having at least one hydroxyl group and a boiling point higher than 150.degree. C. at atmospheric pressure; (c) 0.1-10% by weight of selected amino acid having at least one hydroxyl group; (d) 1-20% by weight of selected redox reagent having a redox potential in the range between +1.0 V and -2.0 V vs. SHE (at pH=7); and (e) 0-90% by weight of water.
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