Method for making continuous thin diamond film
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United States of America Patent
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Mar 4, 1997
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app pub date -
May 5, 1994
filing date -
Oct 21, 1988
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Abstract
A continuous thin diamond film having a thickness of less than about 2 microns has a low leakage. The thin diamond film may be supported on a supporting grid and may be incorporated into an X-ray window. The film may be formed in a DC assisted CVD process where in a first phase a relatively high concentration of a carbonaceous gas is introduced into the reactor and in a second phase the concentration of the carbonaceous gas is reduced to a lower value.
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