Metallurgical silicon with controlled microstructure for the preparation of halogenosilanes
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United States of America Patent
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Feb 25, 1997
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app pub date -
Feb 17, 1995
filing date -
Feb 25, 1994
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Abstract
A metallurgical silicon with controlled microstructure for the preparation of halogenosilanes, characterized by an image of the microstructure obtained with the scanning electron microscope which is processed by binarization between an intermetallic phase and a silicon matrix, with expansion in zones corresponding to the intermetallic phase with an extension of about 10 .mu.m around these zones. The ratio of the surface fraction of the intermetallic phase after expansion to the intermetallic phase before expansion, S/S.sub.0, is between 20 and 40. The silicon according to the invention assures an elevated reactivity in the Rochow reaction for the production of halogenosilanes intended for the preparation of silicones.
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