Metal ion reduction in novolak resins and photoresists
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 14, 1997
Issued Date -
N/A
app pub date -
Jul 11, 1994
filing date -
Dec 18, 1991
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully