Photosensitive compositions comprising photosensitive polyfunctional aromatic diazo compounds, and presensitized lithographic plates formed with the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5589315
SERIAL NO

08369503

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A photosensitive composition containing a polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and lithographic printing plates and screen printing plates formed with the same: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms; R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --; X.sup.- is an anion based on protonic acid from which a proton is removed.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
TOYO GOSEI KOGYO CO LTDICHIKAWA-SHI CHIBA 272-0012

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hozumi, Ichiro Funabashi, JP 2 3
Iida, Hirotada Funabashi, JP 7 13
Kuniyoshi, Yasuo Funabashi, JP 8 92
Tochizawa, Noriaki Funabashi, JP 12 51
Tokuda, Katsuyo Funabashi, JP 3 5
Watanabe, Masaharu Funabashi, JP 37 451

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation