Modified reaction chamber and improved gas flushing method in rapid thermal processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 3, 1996
Grant Date -
N/A
app pub date -
Feb 13, 1995
filing date -
Mar 5, 1994
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A reaction chamber for a Rapid Thermal Processing (RTP) system contains an aperture to allow introduction and removal of the object to be processed. The cross sectional area of the aperture is significantly less than the cross sectional area of the reaction chamber. A method of flushing the reaction chamber, using a short time laminar flow of the flush gas, is used in combination with the aperture to increase the throughput of the RTP system.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully