Polishing pad conditioning
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United States of America Patent
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Oct 29, 1996
Grant Date -
N/A
app pub date -
Jul 3, 1995
filing date -
Jul 3, 1995
priority date (Note) -
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status (Latency Note)
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Abstract
A rotating polishing wheel having secured to its top surface a polishing pad and a vertically movable carrier element for carrying a workpiece to be polished into contact with the polishing pad and exerting a desired pressure on the workpiece. Operatively attached to the carrier is a conditioning element movable with the carrier and having on its bottom surface cutting means disposed in a circular configuration for conditioning the polishing pad by contact therewith.
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