Semiconductor member and semiconductor device having a substrate with a hydrogenated surface
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 6, 1996
Issued Date -
N/A
app pub date -
Dec 19, 1995
filing date -
Jan 31, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A semiconductor member with a monocrystalline semiconductor layer for forming a functional element. The main plane of the monocrystalline semiconductor layer has a center line average surface roughness Ra of not more than 0.4 nm when the main plane is washed with an aqueous ammonia-hydrogen peroxide solution in a ratio of NH.sub.4 OH:H.sub.2 O.sub.2 :H.sub.2 O of 1:1:5 by volume at a washing temperature of 85.degree. C. for a washing time of 10 minutes.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully